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rcwa

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Open-source EUV lithography simulator in Python/PyTorch: Mo/Si mirror, thin-mask and RCWA mask diffraction, partially coherent imaging, chemically amplified resist (Dill, PEB, development) with stochastic LER/LWR, process window and calibration. Every physical default has a named source. Browser GUI and REST API. Apache-2.0.

  • Updated Sep 12, 2026
  • Jupyter Notebook

Lightweight 1D-RCWA validator (TE, normal incidence). TMM cross-verified to machine precision. Energy conservation <1e-10. Pure NumPy. Built for validation & education. | 轻量级一维 RCWA 验证器(TE/正入射)。TMM 交叉验证至机器精度。能量守恒<1e-10。纯 NumPy。专为验证与教学设计。

  • Updated May 6, 2026
  • Python

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